Osun State Polytechnic, Iree (OSPOLY), has officially announced the cut-off mark for the 2025/2026 academic session. If you are planning to apply for admission into this reputable polytechnic, here’s all the information you need to know.
OSPOLY Cut-Off Mark
What is the OSPOLY Cut-Off Mark for 2025/2026?
For the 2025/2026 academic session, Osun State Polytechnic’s general cut-off mark is set at 100. This means that any candidate who scores 100 and above in the Unified Tertiary Matriculation Examination (UTME) is eligible to apply for the Post-UTME screening exercise.
This cut-off mark applies to most National Diploma (ND) full-time programs offered by the institution.
Understanding the Importance of the Cut-Off Mark
A cut-off mark is the minimum score a candidate must obtain in the UTME before being considered for admission into any Nigerian tertiary institution. For polytechnics like OSPOLY, it serves as a benchmark for screening eligible candidates.
Who is Eligible to Apply to OSPOLY?
To be eligible to apply for the 2025/2026 academic session at Osun State Polytechnic, candidates must:
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Have scored 100 or above in the UTME.
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Have chosen OSPOLY as their first choice in JAMB (or be willing to change it to first choice).
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Have a minimum of five (5) O’level credits in relevant subjects including English and Mathematics in not more than two sittings.
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Be ready to participate in the Post-UTME screening exercise once the date is announced.
Courses Offered at OSPOLY
OSPOLY offers a wide range of National Diploma (ND) courses across various schools and departments. Some popular programs include:
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Accountancy
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Mass Communication
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Computer Science
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Science Laboratory Technology
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Business Administration
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Electrical/Electronic Engineering
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Architecture
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Public Administration
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Estate Management
Please note that while the general cut-off mark is 100, highly competitive courses may attract more candidates, so performing well in the Post-UTME is still crucial.
What Happens After Meeting the Cut-Off Mark?
Meeting the cut-off mark is just the first step. Once you’ve scored 100 or above:
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Apply for OSPOLY Post-UTME when the form is released.
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Prepare and participate in the screening.
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Ensure your documents (O’level results, JAMB result, etc.) are valid and uploaded correctly.
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Monitor your admission status on the JAMB CAPS portal.
Post-UTME and Admission Tips
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Prepare well for the Post-UTME screening test (if applicable).
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Ensure you meet the specific subject combination required for your chosen course.
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Upload all necessary documents on JAMB CAPS.
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Follow the OSPOLY admission news via their official website or credible education platforms.
Frequently Asked Questions About OSPOLY Cut-Off Mark
1. What is the cut-off mark for OSPOLY in 2025/2026?
The general cut-off mark for admission into Osun State Polytechnic (OSPOLY) for the 2025/2026 academic session is 100.
2. Can I apply to OSPOLY with a JAMB score of 100?
Yes, if you scored 100 or above in the 2025 UTME, you are eligible to apply for the Post-UTME screening at OSPOLY.
3. Is 100 the cut-off mark for all courses at OSPOLY?
Yes, 100 is the general minimum cut-off mark, but note that competitive courses may require higher performance in the Post-UTME and better O’Level grades to secure admission.
4. What if I scored below 100 in UTME?
Unfortunately, candidates who score below 100 are not eligible to apply for admission into OSPOLY for the 2025/2026 academic session.
5. Do I need to choose OSPOLY as my first choice in JAMB?
Yes, OSPOLY gives admission preference to candidates who selected the polytechnic as their first choice. If you didn’t, you can do a change of institution on the JAMB portal.
6. Is Post-UTME compulsory for OSPOLY?
Yes, all eligible candidates are required to register for and participate in the Post-UTME screening exercise when the form is released.
Conclusion
The announcement of the 100 cut-off mark by Osun State Polytechnic is a positive development for many aspiring students. It opens doors for candidates with lower UTME scores to still pursue quality education and career-focused training.
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